SPIE Advanced Lithography 2014
Organization: SPIE, The International Society for Optics and Photonics
Venue: San Jose Marriott
|Event Date/Time: Feb 23, 2014||End Date/Time: Feb 27, 2014|
|Abstract Submission Date: Sep 10, 2013|
|Paper Submission Date: Jan 28, 2014|
SPIE Advanced Lithography is the internationally recognized forum for reporting state-of-the-art research and development in optical lithography, resists, metrology, EUV, immersion, double patterning, DFM, and imprint lithography.
SPIE Advanced Lithography draws more than 4,000 attendees and about 50 exhibitors, representing the most talented researchers and managers working in the lithography industry. Leading experts offer courses that will keep you and your team current.
Featuring presentations on:
+ Advanced Etch Technology for Nanopatterning
+ Extreme Ultraviolet (EUV) Lithography
+ Alternative Lithographic Technologies
+ Metrology, Inspection, and Process Control for Microlithography
+ Advances in Resist Materials and Processing Technology
+ Optical Microlithography
+ Design for Manufacturability through Design-Process Integration
Courses: Advanced Lithography 2014 will include 12 half- and full-day technical short courses on topics ranging from lithography fundamentals to emerging approaches including Directed Self Assembly (DSA) and EUV lithography. 2014 course lists and descriptions will be available October 2013.