The 33rd Annual SPIE Photomask Symposium, organized by SPIE and BACUS, the International Technical Group of SPIE, provides the forum to present the newest findings, to discuss the most exciting trends, and to ponder reliable solutions in this rapidly developing industry and their effects on the semiconductor lithography.

Mask Making
+ Mask data preparation
+ Substrates and materials
+ Patterning tools and processes
+ Resist and resist processing
+ Etch techniques
+ Metrology
+ Inspection
+ Repair
+ Cleaning, contamination, and haze
+ Simulation of mask making

9-inch Glass
+ Impact of 450mm wafers on reticle and infrastructure
+ Tool developments to support larger blanks
+ Material developments

Emerging Mask Technologies
+ EUV mask making
+ EUV mask inspection and repair
+ EUV mask infrastructure
+ EUV mask application
+ Nanoimprint mask making
+ Nanoimprint mask application
+ Pixelated masks
+ Alternative mask technologies
+ Grey-scale masks
+ Direct-write, ML²

Mask Application
+ Double- and multi-patterning
+ Resolution enhancement techniques and OPC
+ Source/mask optimization
+ Design for manufacturability
+ Patterned media
+ Simulation and modeling
+ Inverse lithography technology

Mask Business
+ Mask manufacturing control
+ Mask shop management
+ Mask management in wafer fabs
+ Business aspects of masks
+ Infrastructure