Challenges in Predictive Process Simulation (ChiPPS-2002) (ChiPPS-2002)
|Event Date/Time: Oct 13, 2002||End Date/Time: Oct 17, 2002|
|Registration Date: Oct 13, 2002|
|Early Registration Date: Jul 15, 2002|
|Abstract Submission Date: Jun 15, 2002|
|Paper Submission Date: Oct 13, 2005|
3'rd International Workshop on
Challenges in Predictive Process Simulation
Prague, Czech Republic, 13-17 October 2002
Covering semiconductor physics and technology, such as:
- Diffusion in solids
- Carrier transport in nanostructures
- Deposition of dielectrics and metals
- Epitaxial growth of semiconductors
- Formation of silicide films
- Reliability of dielectrics and interconnects
- New materials for microelectronics
- New concepts for microelectronic devices
ChiPPS-2002 continues a
series of interdisciplinary meetings
aimed to bring together experts from three fields that rarely have an opportunity to combine their expertise: specialists in the processing of semiconductor devices, in the development of process simulation tools, and in fundamental materials science. In particular, it serves as a bridge between those who investigate physical properties at the atomic cale and those who simulate technological processing steps at the macroscopic level.
The main purpose of the workshop is to identify current and anticipated challenges in process simulation for semiconductor microchip technology from the point of view of users, programmers, and physicists. It is a ``call for action'' meeting, meant to stimulate a new wave of research in fieldS relevant to process simulation by clarifying the needs and pointing out the advantages and deficiencies in the existing theoretical as well as experimental approaches. In particular, the role of COLOR="#b00000"> parameter free numerical methods is explored.
The workshop has a character of a summer school and is built around invited talks. It is organized along the needs versus methods line. We intend to bring together people who use process simulators and those who write them, people who formulate models of processes and those who calibrate them, and people who do nothing of this kind but have mastered theoretical or experimental methods which may have an impact on the evolution of the field. Since the purpose of the meeting is to establish permanent interdiscpilinary links, the participants are expected to contribute actively to the program of the workshop.
Significant success has been achieved over the years through simulation of technological processes. However, process simulators sometimes lack sufficient predictive capability, wielding interpolative rather than extrapolative power. Models have to be revamped for every new generation. Parameters have to be
refined in new process windows.
This deficiency can be TARGET="UpperRightFrame">traced back to
the lack of physical consistency in the models. Due to insufficient understanding of underlying physics, experimental data routinely available as input for modeling is often interpreted in a phenomenological way, which sometimes results in greatly oversized sets of mutually dependent and physically meaningless parameters. For this reason, the International Semiconductor Technology Roadmap ( HREF="http://public.itrs.net/Files/2000UpdateFinal/2kUdFinal.htm") has pointed out that atomic-scale physics should be built into process simulations.
On the other hand, many experimentalists and theoreticians habitually deal with atomic-scale solid-state physics. Methods which could clarify the physical background of the essential technological processes are likely to be found ready or nearly ready in their laboratories. However, atomic-scale physics
belongs to the realm of basic, ``academic'' science, being primarily driven by curiosity of researches and not by industrial needs. We intend to direct at least a part of this curiosity towards the rich pool of problems which are relevant to process simulations. This may provide a basis for a fruitful synergy between the fund-hungry fundamental science and the knowledge-hungry industrial science.
Regular talks (60 min with discussion) are by invitation only. The Committee may upgrade some of the submitted papers to the invited status. If you would like to have your paper considered for upgrade, please contact us directly.
Every participant can (but is not obliged to) present a poster displayed during the whole meeting. Posters will be announced orally before the first poster session. We will allocate 3-min slots for each announcement. Participants interested in using this opportunity will submit their viewgraphs electronically in advance (see Time Schedule).
Participants are encouraged to submit papers for conference proceedings published traditionally in an Elsevier journal.
- Ingo Bork, Avant!, USA
- Vladimir Chab, Institute of Physics, Czech Republic
- Sorin Cristoloveanu, LPCS-ENSERG, France
- Jarek Dabrowski, IHP, Germany (co-chair)
- Ulrich Gösele, Max Planck Institute for Microstructure Physics, Germany
- Vladimir Matolin, Charles University, Prague, Czech Republic
- Hans-Joachim Müssig, IHP, Germany (chair)
- Matthias Scheffler, FHI, Germany
- Udo Schwalke, TU Darmstadt, Germany
- Vladimir Strakos, ON Semiconductor, Czech Republic
The congference program is available in pdf
Application and Registration
If you would like to be included in our mailing list but would prefer to register later, please notify us now by sending an informal email to email@example.com.
- lodging from 13 to 17 October
- breakfast (14-17 Oct), lunch (14-17 Oct), dinner (14-15 Oct), banquet on 16 Oct
- refreshments during breaks
- abstract book
- Conference proceedings
It is not possible to order lodging for shorter time. If you want to come earlier and/or stay longer in the hotel, please contact us directly.
|Abstract submission deadline:||15 Jun 2002|
|Acceptation Notification:||24 Jun 2002|
|Early payment deadline:||15 Jul 2002|
|Viewgraph submission:||15 Sep 2002|
|Fee refund deadline:||15 Sep 2002|
|Late registration:||at the conference|
|Paper submission:||at the conference|
|Meeting begins:||13 Oct 2002 afternoon|
|Meeting ends:||17 Oct 2002 afternoon|