Event Date/Time: Sep 09, 2003
End Date/Time: Sep 12, 2003
The Annual BACUS Symposium is the premier worldwide technical conference for the photomask industry. As a Technical Group of SPIE, BACUS members meet year round to focus on issues that are key to the industry. This year's four-day symposium will focus on emerging and on-going issues facing the photomask industry. Exhibition: We're expecting the people, institutions, and companies that drive the mask-making business. Engineers, scientists, chemists and corporate managers will make their way to beautiful Monterey, California to attend this premier event. Last year's exhibition was sold out, so be sure to secure your space soon! Conferences include: data preparation and data management, OPC and mask technologies for optical extensions, phase-shift masks, design and process integration, design and data modeling, mask pattern generation, photomask processes and control, photomask materials, defect inspection and repair, cleaning and pelliclization, wafer fab issues with masks, metrology, mask quality and specifications, 157 mask technology, EUV mask technology, and NGL mask technology.