| Description |
Photomask Japan 2004 is the 11th International Symposium on Photomasks and NGL Masks in the Far East. The aim of this symposium is to bring together engineers and investigators from Japan, the USA, and all over the world; investigators in the field of photomasks, NGL masks, and related technologies interested in discussing recent progress, applications, and future trends. The conference program will feature invited papers, contributed papers, poster sessions, and a rump session with panel discussion. Display/exhibit opportunities will be provided to mask manufacturing materials, and equipment companies.
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