25th Annual BACUS Symposium on Photomask Technology 2005

Venue: Monterey Marriott and Monterey Convention Center

Location: Monterey, California, United States

Event Date/Time: Oct 03, 2005 End Date/Time: Oct 07, 2005
Abstract Submission Date: Apr 18, 2005
Paper Submission Date: Sep 05, 2005
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The Annual BACUS Symposium is the premier worldwide technical conference for the photomask industry. As a Technical Group of SPIE, BACUS members meet year-round to focus on issues that are key to the industry. This year's four-day symposium will give the authors a chance to present their research on emerging and on-going issues facing the photomask industry in advanced lithography and their manufacturing and data solutions.