SPIE Advanced Lithography 2008 (AL08)
Venue: San Jose Convention Center
|Event Date/Time: Feb 24, 2008||End Date/Time: Feb 29, 2008|
|Registration Date: Feb 24, 2008|
|Early Registration Date: Feb 03, 2008|
|Abstract Submission Date: Aug 13, 2008|
|Paper Submission Date: Jan 28, 2008|
The SPIE Advanced Lithography Symposium is the premier annual international forum bringing practitioners of micro- and nanolithography together in a stimulating, informative, and interactive environment. The Symposium is fully committed to support your interests whether you work in semiconductor production lines, pilot lines, or research laboratories. It succeeds because the programs are tailored to professionals developing and using cutting-edge technologies and techniques. Also, the numerous short courses offered taught by individuals who are active in the field and recognized for their theoretical knowledge and practical experience.