Event Date/Time: Feb 24, 2008 End Date/Time: Feb 29, 2008
Registration Date: Feb 24, 2008
Early Registration Date: Feb 03, 2008
Abstract Submission Date: Aug 13, 2008
Paper Submission Date: Jan 28, 2008
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The SPIE Advanced Lithography Symposium is the premier annual international forum bringing practitioners of micro- and nanolithography together in a stimulating, informative, and interactive environment. The Symposium is fully committed to support your interests whether you work in semiconductor production lines, pilot lines, or research laboratories. It succeeds because the programs are tailored to professionals developing and using cutting-edge technologies and techniques. Also, the numerous short courses offered taught by individuals who are active in the field and recognized for their theoretical knowledge and practical experience.