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SPIE Advanced Lithography 2008

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Event SPIE Advanced Lithography 2008
Begins February 24, 2008
Ends February 29, 2008
Papers January 28, 2008
Ab. AL08
Country USA
State California
City San Jose
.
Category Science
Category 2 Computers: Microprocessors
Category 3 Science: Information_Technology
Exhibits Y
Organization
Contact 1000 20th St Bellingham, WA 98225
URL http://spie.org/advanced-lithography.xml?WT.mc_id=RCALENDARW
Venue San Jose Convention Center
Description industry.
The SPIE Advanced Lithography Symposium is the premier annual international forum bringing practitioners of micro- and nanolithography together in a stimulating, informative, and interactive environment. The Symposium is fully committed to support your interests whether you work in semiconductor production lines, pilot lines, or research laboratories. It succeeds because the programs are tailored to professionals developing and using cutting-edge technologies and techniques. Also, the numerous short courses offered taught by individuals who are active in the field and recognized for their theoretical knowledge and practical experience.
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