SPIE Lithography Asia 2008 - Taiwan (TL08)

Venue: Sheraton Taipei Hotel

Location: Taipei, Taiwan

Event Date/Time: Nov 04, 2008 End Date/Time: Nov 06, 2008
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Description

It is our great pleasure to invite you to attend the first SPIE Lithography Asia conference, featuring presentations from leading researchers, developers, and innovators. This is your opportunity to hear the latest research and connect with others working at the leading edge of semiconductor device technologies.
Conference topics will include:
Emerging Lithographic Technology and Nanofabrication
• Optical lithography extension (shorter than 157 nm)
• EUV lithography
• E- and ion- beam technology
• Nano-imprint lithography
• Application on nanostructures
Optical Microlithography
• ArF immersion lithography
• RET technology
• Double exposure/double patterning lithography
• OPC modeling
• Photo cluster automation
Advances in Resist Material and Processing
• Emerging resist materials
• Advancement in immersion resists
• Resist process optimizations
• Resist material for LCD application
• Double exposure material
Metrology, Inspection, and Process Control
• Advancement in CD metrology
• Advancement in overlay metrology
• Advancement in defect inspection
• Process control for CD and overlay
LCD Application
• Imaging technology
• Process control
• Material technology
• Automation and productivity

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