SPIE Lithography Asia 2008 - Taiwan (TL08)
Venue: Sheraton Taipei Hotel
Event Date/Time: Nov 04, 2008 | End Date/Time: Nov 06, 2008 |
Description
Conference topics will include:
Emerging Lithographic Technology and Nanofabrication
• Optical lithography extension (shorter than 157 nm)
• EUV lithography
• E- and ion- beam technology
• Nano-imprint lithography
• Application on nanostructures
Optical Microlithography
• ArF immersion lithography
• RET technology
• Double exposure/double patterning lithography
• OPC modeling
• Photo cluster automation
Advances in Resist Material and Processing
• Emerging resist materials
• Advancement in immersion resists
• Resist process optimizations
• Resist material for LCD application
• Double exposure material
Metrology, Inspection, and Process Control
• Advancement in CD metrology
• Advancement in overlay metrology
• Advancement in defect inspection
• Process control for CD and overlay
LCD Application
• Imaging technology
• Process control
• Material technology
• Automation and productivity