Event Date/Time: Sep 14, 2009 End Date/Time: Sep 18, 2009
Abstract Submission Date: Mar 02, 2009
Paper Submission Date: Aug 17, 2009
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The Annual SPIE/BACUS Symposium is the premier worldwide technical conference and exhibition for the photomask industry.
This year's four-day symposium will give you the chance to engage with the most up-to-date research on emerging and on-going issues facing the photomask industry in advanced lithography and their manufacturing and data solutions. With the deep sub-wavelength era upon us, the industry's progress will depend on the successful integration and optimization of design, mask-making, and wafer fabrication.
Help solve the most pressing issues in:
Mask Infrastructure
• Materials
• Patterning
• Resist Processing
• Etch
• Inspection
• Cleaning
• Repair
• Metrology
Mask Integration
• Double patterning
• Design for Manufacturing/Process Integration and yield optimization
• Source/mask optimization
• Simulation and Tolerancing for Hyper-NA Applications
• Substrates and Materials
• Extreme NA/Immersion Applications
• Reticle Enhancement and Optical Proximity Effects
• Mask Data Preparation and Mask Rules Development
• Advanced RET
• DFM Opportunities for Fabless Applications
Emerging Mask Technology
• Double patterning
• EUV Mask Materials
• EUV Mask Infrastructure
• Imprint
• Gray Scale Technology
Mask Business
• Mask Business and Management
• Direct Write/Maskless Technology