Basics of Particle Technology Underlying Filtration and Contamination Control

Venue: Chicago Marriott Schaumburg

Location: Schaumburg, Illinois, United States

Event Date/Time: May 04, 2009 End Date/Time: May 04, 2009
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Description

One could argue that the need to control airborne particles as small as nano sizes gave birth to the contamination control industry. Although current practices, especially in microelectronics, have rightly focused on airborne molecular contaminants, efforts to control airborne particles continue to be a significant part of the industry. The mechanisms of particle behavior are the basis for the design, manufacture, and testing of products as well as for activities such as the design, manufacture, and testing of high-efficiency air filters and cleanrooms, particle deposition, particle measurements, and cleanroom validation. This tutorial offers a primer on particle behavior in air, such as diffusion, impaction, and particle interaction with light. Methods of characterizing particle size distributions common to the science will be addressed in an attempt to demystify terms such as “mass mean” and “geometric mean.” The objective of the tutorial is to give practitioners an overview of the science behind their products, services, or processes for controlling particles in air. This course is intended for those involved with airborne particle contamination control, including product and process design engineers for cleanrooms and cleanroom products, certifiers and validators, and anyone interested in learning more about the science underlying the control of airborne particle contamination. Professionals new to the industry, in particular, will benefit.

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