Event Date/Time: Feb 26, 2011 End Date/Time: Mar 04, 2011
Registration Date: Feb 28, 2011
Abstract Submission Date: Aug 16, 2010
Paper Submission Date: Jan 31, 2011
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Description

SPIE Advanced Lithography is the internationally recognized forum for reporting state-of-the-art research and development in optical lithography, resists, metrology, EUV, immersion, double patterning, DFM, and imprint lithography.
SPIE Advanced Lithography draws over 4,000 attendees and 140 exhibitors, representing the most talented researchers and managers working in the lithography industry. Leading experts offer courses that will keep you and your team current.
Featuring presentations on:
+ Alternative Lithographic Technologies
+ Metrology, Inspection, and Process Control for Microlithography
+ Advances in Resist Materials and Processing Technology
+ Optical Microlithography
+ Design for Manufacturability through Design-Process Integration

Venue