Event Date/Time: Feb 12, 2012 End Date/Time: Feb 16, 2012
Registration Date: Feb 15, 2012
Abstract Submission Date: Aug 01, 2011
Paper Submission Date: Jan 16, 2012
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Description

SPIE Advanced Lithography is the internationally recognized forum for reporting state-of-the-art research and development in optical lithography, resists, metrology, EUV, immersion, double patterning, DFM, and imprint lithography.
SPIE Advanced Lithography draws over 4,000 attendees and 140 exhibitors, representing the most talented researchers and managers working in the lithography industry. Leading experts offer courses that will keep you and your team current.
Featuring presentations on:
+ Extreme Ultraviolet (EUV) Lithography
+ Alternative Lithographic Technologies
+ Metrology, Inspection, and Process Control for Microlithography
+ Advances in Resist Materials and Processing Technology
+ Optical Microlithography
+ Design for Manufacturability through Design-Process Integration
+ Advanced Etch Technology for Nanopatterning
Courses: Advanced Lithography 2012 will include 12 half- and full-day technical short courses on topics ranging from lithography fundamentals to emerging approaches including EUV and double patterning. 2012 course lists and descriptions will be available September 2011.

Venue

Additional Information

Exhibition Dates: 15 - 15 February 2012 See the latest technology in advanced lithography: + Lithography: immersion, double patterning, e-beam, EUV, optical/laser, RET + Metrology, inspection, OPC, and process control + Design and manufacturing software + Materials and chemicals + Imaging equipment + Lasers + Resist materials and processing + Nano-imprint + IC and chip fabrication + Nanoscale imaging Exhibition Dates and Hours: Tuesday 14 February | 10:00 am to 5:00 pm Wednesday 15 February | 10:00 am to 4:00 pm