SPIE Advanced Lithography 2012 (AL12)
|Event Date/Time: Feb 12, 2012||End Date/Time: Feb 16, 2012|
|Registration Date: Feb 15, 2012|
|Abstract Submission Date: Aug 01, 2011|
|Paper Submission Date: Jan 16, 2012|
SPIE Advanced Lithography draws over 4,000 attendees and 140 exhibitors, representing the most talented researchers and managers working in the lithography industry. Leading experts offer courses that will keep you and your team current.
Featuring presentations on:
+ Extreme Ultraviolet (EUV) Lithography
+ Alternative Lithographic Technologies
+ Metrology, Inspection, and Process Control for Microlithography
+ Advances in Resist Materials and Processing Technology
+ Optical Microlithography
+ Design for Manufacturability through Design-Process Integration
+ Advanced Etch Technology for Nanopatterning
Courses: Advanced Lithography 2012 will include 12 half- and full-day technical short courses on topics ranging from lithography fundamentals to emerging approaches including EUV and double patterning. 2012 course lists and descriptions will be available September 2011.