Event Date/Time: Sep 14, 2011
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End Date/Time: Sep 16, 2011 |
Registration Date:
Aug 22, 2011 |
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Early Registration Date:
Jul 15, 2011 |
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Abstract Submission Date:
Jul 15, 2011 |
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Description
Hard X-ray photoelectron spectroscopy is a relatively new technique rapidly developing at synchrotron facilities worldwide. Its larger probing depth (typ. 10-20 nm) makes it a powerful tool for studies of complex materials, buried nano-structures and multi-layered structures relevant for device applications. This international workshop will bring together experts in the field, present an overview of recent activities and achievements and provide a platform for the discussion of emerging new applications and future trends.
Venue