Hard X-ray photoelectron spectroscopy is a relatively new technique rapidly developing at synchrotron facilities worldwide. Its larger probing depth (typ. 10-20 nm) makes it a powerful tool for studies of complex materials, buried nano-structures and multi-layered structures relevant for device applications. This international workshop will bring together experts in the field, present an overview of recent activities and achievements and provide a platform for the discussion of emerging new applications and future trends.