Event Date/Time: Sep 10, 2012 End Date/Time: Sep 13, 2012
Registration Date: Sep 12, 2012
Abstract Submission Date: Mar 12, 2012
Paper Submission Date: Aug 23, 2012
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The Annual SPIE/BACUS Symposium is the premier worldwide technical conference and exhibition for the photomask industry. With the deep sub-wavelength era upon us, the industry's progress will depend on the successful integration and optimization of design, mask-making, and wafer fabrication.
Help solve the most pressing issues in:
Mask Making
+ Mask data preparation
+ Substrates and materials
+ Patterning tools and processes
+ Resist and resist processing
+ Etch techniques
+ Metrology
+ Inspection
+ Repair
+ Cleaning, contamination, and haze
+ Simulation of mask making
Emerging Mask Technologies
+ EUV mask making
+ EUV mask inspection and repair
+ EUV mask infrastructure
+ Nanoimprint mask making
+ Nanoimprint mask application
+ Pixelated masks
+ Alternative mask technologies
+ Mask process correction
+ Grey-scale masks
+ Direct-write, ML²
Mask Application
+ Double- and multi-patterning
+ Resolution enhancement techniques and OPC
+ Source and mask optimization
+ Design for manufacturability
+ Patterned media
+ Simulation and modeling


Additional Information

Exhibition Overview: It is more important than ever that you reach as many of your customers as possible. As the most recognized international meeting for presenting innovations in the mask-making industry, SPIE Photomask Technology is the event for the people, institutions, and companies driving this critical and influential business. See the latest in: + Electron-Beam Lithography + EUV + Metrology + Lasers + Nanotechnology + Optical/Laser Microlithography + Resist Technology and Processing + Software + Electronic Imaging Components AUDIENCE + Engineers and Designers + Corporate Managers From The Mask Making Industry + Application and Product Developers + Mask and Chip Designers + Resist Chemists + Quality Assurance Specialists + Experts in Mask Infrastructure and Mask Integration + People Working in Emerging Mask Technologies Exhibition Dates and Hours: Tuesday 11 September | 10:00 am to 4:30 pm; 6:30 pm to 8:00 pm Wednesday 12 September | 10:00 am to 4:00 pm