SPIE Advanced Lithography 2013 Conference & Exhibition (SPIE Advanced Lithog)

Venue: San Jose Convention Center and San Jose Marriott

Location: San Jose, California, United States

Event Date/Time: Feb 24, 2013 End Date/Time: Feb 28, 2013
Registration Date: Feb 27, 2013
Abstract Submission Date: Sep 10, 2012
Paper Submission Date: Jan 28, 2013
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SPIE Advanced Lithography is the internationally recognized forum for reporting state-of-the-art research and development in optical lithography, resists, metrology, EUV, immersion, double patterning, DFM, and imprint lithography.
SPIE Advanced Lithography draws more than 4,000 attendees and about 50 exhibitors, representing the most talented researchers and managers working in the lithography industry. Leading experts offer courses that will keep you and your team current.
Featuring presentations on:
+ Extreme Ultraviolet (EUV) Lithography
+ Alternative Lithographic Technologies
+ Metrology, Inspection, and Process Control for Microlithography
+ Advances in Resist Materials and Processing Technology
+ Optical Microlithography
+ Design for Manufacturability through Design-Process Integration
Courses: Advanced Lithography 2013 will include 12 half- and full-day technical short courses on topics ranging from lithography fundamentals to emerging approaches including Directed Self Assembly (DSA) and EUV lithography. 2013 course lists and descriptions will be available September 2012.


Additional Information

Exhibition Overview: The Advanced Lithography Exhibition is a highly regarded exhibition for the industry's top semiconductor suppliers, integrators, and manufacturers. SPIE Advanced Lithography has been the premier international event that drives the future of lithography research and applications for more than 35 years. See the latest technology in advanced lithography: + Lithography: immersion, double patterning, e-beam, EUV, optical/laser, RET + Metrology, inspection, OPC, and process control + Design and manufacturing software + Materials and chemicals + Imaging equipment + Lasers + Resist materials and processing + Nano-imprint + IC and chip fabrication + Nanoscale imaging Exhibition Dates and Hours: Tuesday 26 February | 10:00 am to 5:00 pm Wednesday 27 February | 10:00 am to 4:00 pm