SPIE Advanced Lithography 2013 Conference & Exhibition (SPIE Advanced Lithog)
|Event Date/Time: Feb 24, 2013||End Date/Time: Feb 28, 2013|
|Registration Date: Feb 27, 2013|
|Abstract Submission Date: Sep 10, 2012|
|Paper Submission Date: Jan 28, 2013|
SPIE Advanced Lithography draws more than 4,000 attendees and about 50 exhibitors, representing the most talented researchers and managers working in the lithography industry. Leading experts offer courses that will keep you and your team current.
Featuring presentations on:
+ Extreme Ultraviolet (EUV) Lithography
+ Alternative Lithographic Technologies
+ Metrology, Inspection, and Process Control for Microlithography
+ Advances in Resist Materials and Processing Technology
+ Optical Microlithography
+ Design for Manufacturability through Design-Process Integration
Courses: Advanced Lithography 2013 will include 12 half- and full-day technical short courses on topics ranging from lithography fundamentals to emerging approaches including Directed Self Assembly (DSA) and EUV lithography. 2013 course lists and descriptions will be available September 2012.