SPIEs International Symposium on Microlithography 2004

Venue: Santa Clara Convention Center and Westin Hotel

Location: Santa Clara, California, United States

Event Date/Time: Feb 22, 2004 End Date/Time: Feb 27, 2004
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The annual SPIE Microlithography Symposium is a forum that brings together practitioners of the art of lithography into an exciting, informative, and very practical environment. The Symposium has a strong commitment to simultaneously support the interests of people working in semiconductor production lines, pilot lines, and research laboratories. The Symposium covers applications of present state-of-the-art optical lithography tools, resists, metrology, materials characterization, and design and process integration. It covers issues to be faced as we extend these technologies, and issues faced with alternative technologies. This variety looms more important as optical lithography, historically the dominant patterning technology, becomes more difficult to apply to leading edge IC fabrication. The strength of the SPIE Microlithography Symposium is the emphasis on presenting real data and applications.